Sunnyvale, CA, United States of America

Xiaodong Zhang

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xiaodong Zhang. Retrieved from https://idiyas.com/inventor/xiaodong-zhang-8uvrd58r

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Xiaodong Zhang in Optical Metrology

Introduction

Xiaodong Zhang is a notable inventor based in Sunnyvale, CA. He has made significant contributions to the field of optical metrology, particularly in the analysis of substrates and films. His work focuses on enhancing the quality and accuracy of measurements in various applications.

Latest Patents

Xiaodong Zhang holds a patent for "Phase-resolved optical metrology for substrates." This innovative method and apparatus provide phase-resolved optical metrology for determining the qualities of a substrate and the films thereon. By coupling transmitted and reflected signals using both amplitude and phase information, his invention improves the metrology information obtained from film layers on the substrate.

Career Highlights

Xiaodong Zhang is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at Applied Materials has allowed him to apply his expertise in optical metrology to real-world challenges, contributing to advancements in technology and manufacturing processes.

Collaborations

Xiaodong has collaborated with notable colleagues such as Nedal Saleh and Zhiming Jiang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Xiaodong Zhang's contributions to optical metrology exemplify the impact of innovative thinking in technology. His patent and work at Applied Materials, Inc. highlight the importance of precision in measuring substrates and films, paving the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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