Xiaochen Xue

Title: Xiaochen Xue and Semiconductor Innovation

Introduction

Xiaochen Xue is an inventor based in Wuhan, China, associated with Wuhan Xinxin Semiconductor Manufacturing Co., Ltd. His patent work concerns semiconductor device design and fabrication, including the integration of a deep trench capacitor with device structures and interconnects.

Latest Patents

The provided information identifies one patent associated with Xue: “Semiconductor Device Having Deep Trench Capacitor and Method for Making Same.” The patent describes a semiconductor device with a device structure on the front side of a substrate and a deep trench capacitor (DTC) on its backside. Insulating layers and interconnect structures are formed on both sides, while a plug structure electrically connects the device structure to the DTC through those interconnects. The disclosed method addresses how to make this arrangement.

Career Highlights

Xue is associated with Wuhan Xinxin Semiconductor Manufacturing Co., Ltd., a semiconductor manufacturer. His listed patent reflects work on connecting front-side device structures with a backside capacitor through a substrate-spanning electrical path. The supplied data lists 1 patent for him.

Collaborations

Beibei Sheng is identified as Xue’s coworker. The available information does not specify whether Sheng collaborated with him on the patent.

Conclusion

Xiaochen Xue’s listed patent focuses on a semiconductor device that integrates a deep trench capacitor on the substrate’s backside with front-side circuitry, highlighting his documented contribution to semiconductor device engineering.