Sunnyvale, CA, United States of America

Xiaobo Li

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xiaobo Li. Retrieved from https://idiyas.com/inventor/xiaobo-li-wfqhwkrd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Innovations by Xiaobo Li in Semiconductor Processing

Introduction

Xiaobo Li is a notable inventor based in Sunnyvale, California, recognized for his contributions to semiconductor processing technologies. With a focus on enhancing the mechanical strength of low-k films, his work has significant implications for the semiconductor industry.

Latest Patents

Xiaobo Li holds a patent for "RF pulsing assisted low-k film deposition with high mechanical strength." This innovative method involves providing a silicon-containing precursor to a semiconductor processing chamber. The process includes forming a plasma of the silicon-containing precursor, which is generated by RF power operating between 50 W and 1,000 W, at a pulsing frequency below 100,000 Hz, and a duty cycle ranging from 5% to 95%. The resulting layer of material on the substrate comprises a silicon-containing material, showcasing a novel approach to semiconductor fabrication.

Career Highlights

Xiaobo Li is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has positioned him as a key player in advancing semiconductor processing techniques.

Collaborations

Xiaobo has collaborated with notable colleagues, including Ruitong Xiong and Bo Xie, contributing to the development of innovative semiconductor technologies.

Conclusion

Xiaobo Li's innovative work in semiconductor processing, particularly his patented methods for low-k film deposition, highlights his significant impact on the industry. His contributions continue to shape advancements in semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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