Company Filing History:
Years Active: 2019-2022
Title: Innovations of Inventor Xiao Wu
Introduction
Xiao Wu is a notable inventor based in Singapore, SG. He has made significant contributions to the field of semiconductor technology. With a total of 3 patents, his work has garnered attention in the industry.
Latest Patents
Xiao Wu's latest patents include a semiconductor device that features an oxide semiconductor layer disposed over a substrate. This device incorporates a source electrode of a metal nitride and a drain electrode of the same material, both placed on the oxide semiconductor layer. Additionally, a metal-nitride oxidation layer is formed on the surfaces of the source and drain electrodes. Notably, the ratio of the thickness of the metal-nitride oxidation layer to that of the drain or source electrode is equal to or less than 0.2. Another patent focuses on a semiconductor device and method for fabricating the same, which shares similar features and specifications.
Career Highlights
Xiao Wu is currently employed at United Microelectronics Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices.
Collaborations
Xiao Wu collaborates with talented coworkers, including Yen-Chen Chen and Hai Tao Liu. Their combined expertise contributes to the success of their projects and innovations.
Conclusion
Xiao Wu's contributions to semiconductor technology through his patents and collaborations highlight his role as a significant inventor in the field. His work continues to influence advancements in the industry.