Xiao Ma

Title: Innovations of Inventor Xiao Ma

Introduction

Xiao Ma is a notable inventor based in Suzhou, China. He has made significant contributions to the field of materials science, particularly in the development of silicon-containing materials. His innovative work has implications for various high-tech applications, including microelectronics and optoelectronics.

Latest Patents

Xiao Ma holds a patent for "Silane guanidinate derivatives useful for low temperature deposition of silicon-containing materials." This patent describes a guanidinate silane compound that serves as a precursor in vapor deposition processes. The compound can be utilized in chemical vapor deposition and atomic layer deposition at temperatures below 400°C. It is particularly useful for forming silicon-containing films, such as silicon nitride films, which are essential in integrated circuitry, flat-panel displays, solar panels, and other microelectronic applications.

Career Highlights

Throughout his career, Xiao Ma has worked with prominent organizations, including Jiangsu Nata Opto-electronic Material Co., Ltd and Jiangnan University. His experience in these institutions has allowed him to refine his expertise in material science and contribute to innovative research.

Collaborations

Xiao Ma has collaborated with several professionals in his field, including Chongying Xu and Tzuhn-Yan Lin. These collaborations have fostered a productive environment for innovation and research in silicon-containing materials.

Conclusion

Xiao Ma's contributions to the field of materials science, particularly through his patented innovations, highlight his role as a significant inventor. His work continues to influence advancements in microelectronics and optoelectronics.