Shanghai, China

Xianying Wang

USPTO Granted Patents = 5 

Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2013-2021

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5 patents (USPTO):Explore Patents

Title: Innovations of Xianying Wang

Introduction

Xianying Wang is a prominent inventor based in Shanghai, China, known for his significant contributions to the field of technology and engineering. He holds a total of five patents, showcasing his innovative spirit and technical expertise. His work primarily focuses on advancements in lithography machines and nanodevices.

Latest Patents

One of Xianying Wang's latest patents is a vertical control method for use in lithography machines. This method involves a series of steps to ensure precise vertical control during scanning exposure. It includes measuring the overall surface profile of a workpiece, performing global leveling, and real-time adjustments to maintain the upper surface of each exposure field in alignment with a reference focal plane. This innovative approach allows for flexible vertical control with high accuracy.

Another notable patent is related to nanodevices for generating power from molecules and batteryless sensing. This invention describes a nanoconverter capable of generating electricity through interactions with dipole-containing organic molecules. By utilizing high surface-to-volume ratio semiconductor nanowires or nanotubes, the device can identify specific molecule species and supply power to nano- and micro-devices without the need for external batteries. This technology has the potential to harness energy from human breath and other life forms.

Career Highlights

Xianying Wang has worked with several esteemed organizations, including Lawrence Livermore National Security, LLC and Shanghai Micro Electronics Equipment (Group) Co., Ltd. His experience in these companies has contributed to his development as an inventor and innovator in the field.

Collaborations

Xianying Wang has collaborated with notable individuals such as Yinmin Wang and Alex V Hamza. These partnerships have likely fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Xianying Wang's contributions to the fields of lithography and nanotechnology highlight his innovative capabilities and dedication to advancing technology. His patents reflect a commitment to creating solutions that enhance efficiency and sustainability in various applications.

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