Xianliang Deng

Title: Xianliang Deng: Innovator in Semiconductor Technology

Introduction

Xianliang Deng is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

Xianliang Deng holds a patent for a semiconductor crystal growth apparatus. This invention provides a semiconductor crystal growth device that includes a furnace body, a crucible, a pulling device, a horizontal magnetic field applying device, and a deflector. The deflector is barrel-shaped and is positioned above the silicon melt in the furnace body in a vertical direction. The pulling device is designed to pull the silicon ingot through the deflector vertically. Notably, the bottom of the deflector has varying thermal reflection coefficients at different positions. The thermal reflection coefficient in the direction of the horizontal magnetic field is smaller than that in the direction perpendicular to it. This innovative design improves the temperature distribution within the melt silicon and enhances the quality of the semiconductor crystal.

Career Highlights

Xianliang Deng is currently associated with Zing Semiconductor Corporation, where he continues to advance semiconductor technologies. His work has been instrumental in developing devices that enhance the efficiency and quality of semiconductor production.

Collaborations

Xianliang Deng collaborates with notable colleagues, including Weimin Shen and Gang Wang. Their combined expertise contributes to the innovative environment at Zing Semiconductor Corporation.

Conclusion

Xianliang Deng's contributions to semiconductor technology through his patent demonstrate his commitment to innovation in the field. His work not only advances technology but also sets a foundation for future developments in semiconductor manufacturing.