Chengdu, China

Xianchang Zhu

This inventor holds 3 USPTO granted patents and 2 published patent applications. Top assignees: Chinese Academy of Sciences, The Institute of Optics and Electronics. Active years: 2016-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xianchang Zhu. Retrieved from https://idiyas.com/inventor/xianchang-zhu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 3 

% Patents Active = 33.3

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 117(Granted Patents)


Location History:

  • Sichuan, CN (2018)
  • Chengdu, CN (2016 - 2021)

Company Filing History:


Years Active: 2016-2021

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3 patents (USPTO):Explore Patents

Title: Xianchang Zhu: Innovator in Optical Technologies

Introduction

Xianchang Zhu is a prominent inventor based in Chengdu, China. He has made significant contributions to the field of optical technologies, holding a total of 3 patents. His work focuses on enhancing precision in imaging systems and photolithography processes.

Latest Patents

One of his latest patents is a three-dimensional dynamic adjustment and locking mechanism. This invention discloses a three-dimensional adjustment mechanism designed for precise adjustment of an optical element in high-resolution imaging systems. The mechanism includes three elastic adjustment members that are uniformly distributed to conduct both axial displacement and tilt adjustments of the optical element. These members are arranged at the bottom of the optical element and are configured to perform dynamic adjustments with high precision based on their deformations.

Another notable patent is a method for detecting the focal plane based on the grating Talbot effect. This method aims to detect the position of a silicon wafer in a photolithography machine in real time. It facilitates the adjustment of leveling and focal plane of the silicon wafer with high resolution. The detection system utilizes a phase change of 'self-image' generated by the grating Talbot effect, which is caused by the defocusing of the silicon wafer. This system is characterized by its simple structure, higher anti-interference capability, and excellent adaptation to the process.

Career Highlights

Xianchang Zhu has worked with esteemed institutions such as the Chinese Academy of Sciences and the Institute of Optics and Electronics. His experience in these organizations has allowed him to develop innovative solutions in optical technologies.

Collaborations

He has collaborated with notable coworkers, including Song Hu and Lixin Zhao, contributing to advancements in their respective fields.

Conclusion

Xianchang Zhu's innovative work in optical technologies has led to significant advancements in precision imaging and photolithography. His contributions continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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