The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2018
Filed:
Sep. 25, 2015
The Institute of Optics and Electronics, the Chinese Academy of Sciences, Chengdu, Sichuan, CN;
The Institute of Optics and Electronics, Chengdu, Sichuan, CN;
The Chinese Academy of Sciences, Chengdu, Sichuan, CN;
Abstract
The present disclosure relates to a method for detecting focal plane based on a grating Talbot effect, the function of which is to detect position of a silicon wafer in a photolithography machine in real time so as to implement an adjustment of leveling and foal plane of the silicon wafer in a high resolution. The detection system utilizes a phase change of 'self-image' generated by a grating Talbot effect caused by defocusing of the silicon wafer, so as to accomplish the detecting for focal plane of the silicon wafer in the photolithography machine in a high resolution: if the silicon wafer is at a focal plane, the imaged wavefront by the grating is a planar wavefront; and when the silicon wafer is defocused, the imaged wavefront is a spherical wavefront. Such a detection system has a simple structure, a higher anti-interference capability and a perfect adaption of the process.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile