Lixin Zhao

Title: Innovations of Lixin Zhao in Illumination and Photolithography Technologies

Introduction

Lixin Zhao is a prominent inventor based in Sichuan, China, known for his significant contributions to the fields of illumination and photolithography technologies. With a total of five patents to his name, Zhao has developed innovative systems and methods that enhance the precision and efficiency of optical detection and correction.

Latest Patents

Zhao's latest patents include an illumination field non-uniformity detection system, detection method, correction method, and device. This system comprises a displacement control module that drives a photodetector and image sensor to move within the illumination field. The illumination signal acquisition module collects various response signals and images, while the data processing module analyzes these signals to obtain multiple illumination fields with uniform light intensity distribution. The non-uniformity detection module then corrects the response images based on a parameter matrix, characterizing the light intensity distribution's non-uniformity.

Another notable patent is a method for detecting the focal plane based on the grating Talbot effect. This method allows for real-time detection of the position of a silicon wafer in a photolithography machine, facilitating adjustments to the leveling and focal plane. The detection system utilizes the phase change of 'self-image' generated by the grating Talbot effect, providing a simple structure with high anti-interference capability.

Career Highlights

Zhao has worked with esteemed institutions such as the Chinese Academy of Sciences and the Institute of Optics and Electronics. His work has significantly advanced the understanding and application of optical technologies in various industries.

Collaborations

Zhao has collaborated with notable colleagues, including Song Hu and Xianchang Zhu, contributing to the development of innovative solutions in his field.

Conclusion

Lixin Zhao's innovative patents and career achievements highlight his role as a leading inventor in illumination and photolithography technologies. His work continues to influence advancements in optical detection and correction methods.