This inventor holds 1 USPTO granted patent. Top assignee: Lam Research Ag. Active years: 2019.
Company Filing History:
Years Active: 2019
Title: Innovations by Xia Man in Substrate Charge Reduction
Introduction
Xia Man is an accomplished inventor based in Singapore, SG. She has made significant contributions to the field of substrate technology, particularly in reducing surface and embedded charges. Her innovative approach has led to the development of a unique system that addresses these challenges effectively.
Latest Patents
Xia Man holds a patent titled "Reduction of surface and embedded substrate charge by controlled exposure to vacuum ultraviolet (VUV) light in low-oxygen environment." This patent describes a system designed to reduce surface and embedded charge in a substrate. The system includes a substrate support that is configured to support a substrate, along with a vacuum ultraviolet (VUV) assembly that generates and directs ultraviolet (UV) light at the substrate. A movement device is incorporated to move either the VUV assembly or the substrate support during exposure, enhancing the effectiveness of charge reduction.
Career Highlights
Xia Man is currently employed at Lam Research AG, where she continues to innovate and develop new technologies. Her work has been instrumental in advancing the capabilities of substrate processing, making her a valuable asset to her company and the industry.
Collaborations
Xia has collaborated with notable colleagues, including Reinhold Schwarzenbacher and Rafal Ryszard Dylewicz. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Xia Man's contributions to substrate technology through her patent and work at Lam Research AG highlight her role as a leading inventor in her field. Her innovative solutions are paving the way for advancements in substrate processing technology.