This inventor holds 2 USPTO granted patents. Top assignee: Korea Advanced Institute of Science and Technology. Active years: 2020-2021.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020-2021
Title: Woosung Choi and Carbon Dioxide Adsorbent Innovation.
Introduction
Woosung Choi is an inventor based in Daejeon, South Korea. His listed work includes 2 patents and focuses on amine-based materials for capturing carbon dioxide. He is associated with the Korea Advanced Institute of Science and Technology.
Latest Patents
Choi’s listed patent, “Amine-Based Carbon Dioxide Adsorbent Resistant to Oxygen and Sulfur Dioxide and Method of Preparing the Same,” describes a core-shell adsorbent designed to capture carbon dioxide while resisting degradation from oxygen and sulfur dioxide.
The core consists of a porous support with an immobilized amine compound. A chelating agent helps remove transition-metal impurities that can catalyze amine oxidation, while a sulfur-dioxide-resistant amine layer forms the shell. The shell selectively adsorbs sulfur dioxide, helping protect the core, whose amine compound selectively captures carbon dioxide. Sulfur dioxide can be released from the shell at about 110°C, supporting regeneration stability in temperature-swing adsorption processes.
Career Highlights
The described invention addresses durability and regeneration challenges in carbon dioxide capture, particularly in environments containing oxygen and sulfur dioxide. Its design combines impurity control with selective adsorption to help preserve the adsorbent’s performance.
Collaborations
Minkee Choi and Chaehoon Kim are identified as Choi’s coworkers. The available information does not specify their roles in the patent or related research.
Conclusion
Woosung Choi’s listed patent work centers on a more oxidation-resistant, regenerable amine-based adsorbent intended to capture carbon dioxide in the presence of sulfur dioxide.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
