Company Filing History:
Years Active: 2025
Title: Woonghyun Jeung: Innovator in Etching Technology
Introduction
Woonghyun Jeung is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of etching technology, particularly through his innovative methods and apparatus.
Latest Patents
Woonghyun Jeung holds a patent for an etching method and etching apparatus. This patent involves providing a substrate with a three-layered film composed of a first silicon oxide-based film, a silicon nitride-based film, and a second silicon oxide-based film. The method includes collectively etching the three-layered film using a HF—NH-based gas while adjusting the gas ratio in each layer.
Career Highlights
Woonghyun Jeung is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has contributed to advancements in etching processes, which are crucial for the production of integrated circuits.
Collaborations
Some of his coworkers include Toshinori Debari and Reiko Sasahara, who have collaborated with him on various projects within the company.
Conclusion
Woonghyun Jeung's innovative work in etching technology showcases his expertise and commitment to advancing the semiconductor industry. His contributions are valuable to the ongoing development of efficient manufacturing processes.