Suwon, South Korea

Woon Seong Kwon

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Woon Seong Kwon. Retrieved from https://idiyas.com/inventor/woon-seong-kwon-7p88315s

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Woon Seong Kwon and Semiconductor Manufacturing Innovation.

Introduction

Woon Seong Kwon is an inventor based in Suwon, South Korea, associated with Samsung Electronics Co., Ltd. His patent work concerns semiconductor-device manufacturing and the use of electroless plating to achieve an even coating thickness.

Latest Patents

Kwon is credited with 1 patent: “Method of Manufacturing a Semiconductor Device Having an Even Coating Thickness Using Electro-less Plating, and Related Device.” The disclosed method forms a diffusion barrier layer on a substrate and creates at least two features, with the barrier layer positioned between each feature and the substrate. The features are located in different impurity regions, which electrically isolate one feature from the other. The patent describes a semiconductor fabrication approach involving coating uniformity and device structure.

Career Highlights

Kwon’s listed patent reflects work in semiconductor processing and device fabrication. His association with Samsung Electronics connects his inventive activity to a company active in electronics and semiconductor technologies.

Collaborations

Un Byoung Kang and Chung Sun Lee are identified as Kwon’s coworkers. The available information does not specify their roles in the patent or whether they collaborated directly on it.

Conclusion

Woon Seong Kwon’s recorded invention focuses on semiconductor-device manufacturing, combining a diffusion barrier structure with electrically isolated features and an electroless-plating process intended to support even coating thickness.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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