WooJin Jang

Title: Innovations of WooJin Jang in Semiconductor Technology

Introduction

WooJin Jang is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on methods for fabricating integrated circuit devices and electronic systems.

Latest Patents

One of his latest patents is titled "Method of fabricating integrated circuit device and method of fabricating electronic system having the same." This innovative method involves forming a mold stack on a semiconductor substrate, which includes alternating insulating and mold layers. A mask pattern is created, followed by the formation of a channel hole and a sacrificial film. An oxidation process is then performed to convert the sacrificial film into a sacrificial oxide film, which is subsequently removed through an etching process.

Another notable patent is "Semiconductor device having metal interconnections." This method outlines the formation of a low-k dielectric layer with an opening, followed by the creation of a barrier metal pattern and a metal pattern. The process includes a selective chemical vapor deposition to form a metal capping layer, ensuring that the thickness on the metal pattern is greater than that on the low-k dielectric layer.

Career Highlights

WooJin Jang is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in semiconductor technologies. His expertise and contributions have positioned him as a key figure in the industry.

Collaborations

He has collaborated with notable coworkers, including KyoungWoo Lee and Kyoungwoo Lee, further enhancing the innovative environment at Samsung Electronics.

Conclusion

WooJin Jang's work in semiconductor technology exemplifies the spirit of innovation and dedication to advancing electronic systems. His patents reflect a deep understanding of fabrication methods that are crucial for the development of modern integrated circuits.