Suwon, South Korea

Woo Yong Lim

This inventor holds 1 USPTO granted patent. Top assignees: Auros Technology, Inc., Samsung Electronics Co., Ltd.. Active years: 2025.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Woo Yong Lim: Innovator in Overlay Measurement Technology

Introduction

Woo Yong Lim is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of overlay measurement technology, particularly with his innovative patent that enhances measurement accuracy in layered structures.

Latest Patents

Woo Yong Lim holds a patent for a "Device and method for overlay measurement which control focus movement." This invention includes a light source that directs illumination to an overlay measurement target, where a first overlay key in a first layer and a second overlay key in a second layer are positioned. The second layer is either stacked on top of or below the first layer. The device features a lens assembly with an objective lens that condenses the illumination on a measurement position and a lens focus actuator that controls the distance between the objective lens and the overlay measurement target. Additionally, a detector acquires a focus image at the measurement position based on the beam reflected from it. Woo Yong Lim has 1 patent to his name.

Career Highlights

Throughout his career, Woo Yong Lim has worked with prominent companies in the technology sector. He has been associated with Auros Technology, Inc. and Samsung Electronics Co., Ltd., where he has contributed to various projects and innovations in measurement technologies.

Collaborations

Woo Yong Lim has collaborated with talented individuals such as Jun Yeob Kim and Ji Yun Jung, enhancing the development of his innovative solutions.

Conclusion

Woo Yong Lim's contributions to overlay measurement technology demonstrate his expertise and commitment to innovation. His work continues to influence the field and pave the way for future advancements.

Profile summary based on public USPTO records.
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