Yongin, South Korea

Woo-Jin Kim

This inventor holds 30 USPTO granted patents and 4 published patent applications, primarily in Magnetoresistive Memory. Top assignees: Samsung Electronics Co., Ltd., Samsung Sdi Co., Inc.. Active years: 2005-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Woo-Jin Kim. Retrieved from https://idiyas.com/inventor/woo-jin-kim-rhm42mtp

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 30 

% Patents Active = 83.3

Average Co-Inventor Count = 3.7

ph-index = 5

Forward Citations = 112(Granted Patents)


Location History:

  • Ahsan, KR (2006)
  • Gyeonggi-do, KR (2006)
  • Asan-si, KR (2008)
  • Asan, KR (2005 - 2009)
  • Suwon-si, KR (2009 - 2020)
  • Yongin-si, KR (2012 - 2020)
  • Hwaseong-si, KR (2018 - 2023)

Company Filing History:


Years Active: 2005-2023

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Areas of Expertise:
Magnetoresistive Random Access Memory
Semiconductor Device
Non-Volatile Memory
System-on-Chip
Thermal Endurance
Magnetic Device
Plasma Display Panel
Bus Interface
Manufacturing Method
MTJ Structures
Asynchronous Interface
Pattern Structures
30 patents (USPTO):Explore Patents

Title: Innovations and Achievements of Woo-Jin Kim

Introduction

Woo-Jin Kim is a prominent inventor based in Yongin-si, South Korea, recognized for his significant contributions to the field of magnetoresistive random access memory (MRAM) technology. With a remarkable portfolio of 30 patents, he has continuously innovated and advanced memory device technologies.

Latest Patents

Among his latest innovations, Woo-Jin has developed a method of manufacturing an MRAM device. This method involves several complex processes: forming a first magnetic layer on a substrate, followed by a first tunnel barrier layer consisting of a first metal oxide, which is created by oxidizing a metal layer at a specific temperature. Additionally, a second tunnel barrier layer with a second metal oxide is formed through oxidizing a second metal layer at a higher temperature. Finally, a second magnetic layer is established on the second tunnel barrier layer.

Another notable patent is the method of manufacturing a magnetoresistive random access memory device that incorporates a first insulating interlayer over a substrate, which includes a cell region and a peripheral region. It features lower electrode contacts and a stacked structure comprising a lower electrode, a magnetic tunnel junction structure, and an upper electrode, all covered with a capping layer that has been precisely designed to have varying height surfaces in the peripheral and cell regions.

Career Highlights

Woo-Jin has made substantial strides in his career through his tenure at major companies, notably Samsung Electronics Co., Ltd. and Samsung SDI Co., Inc. His work in these organizations has been pivotal in shaping modern memory technology and enhancing device efficiency.

Collaborations

Throughout his career, Woo-Jin Kim has collaborated with talented colleagues, including Se-Chung Oh and Jeong-Heon Park, who have contributed to his research and development endeavors, further fostering innovation in the field of MRAM technology.

Conclusion

Woo-Jin Kim’s extensive patent portfolio and innovative contributions underscore his status as a leading figure in the realm of memory technology. His hard work and collaborations continue to pave the way for advancements that will shape the future of electronic memory devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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