Daejeon, South Korea

Woo Hyun Lee

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Woo Hyun Lee. Retrieved from https://idiyas.com/inventor/woo-hyun-lee-5c8hhg0k

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Woo Hyun Lee: Semiconductor Manufacturing Innovation.

Introduction

Woo Hyun Lee is an inventor based in Daejeon, South Korea, and is associated with Samsung Electronics Ltd. His patent work concerns substrate treatment and semiconductor device manufacturing.

Latest Patents

Lee is credited with 1 patent: “Substrate Treatment Apparatus and Semiconductor Device Manufacturing Method Using the Same.” The invention describes a method that loads a substrate into a treatment apparatus, performs deposition, and then cleans the apparatus. Its system uses a housing, process-gas supply, remote plasma supply, and shower head to deliver plasma into the treatment area. A second process plasma is used to clean membrane material deposited on the housing’s inner wall.

Career Highlights

Lee’s listed patent focuses on integrating deposition and equipment cleaning into a semiconductor manufacturing process. The apparatus is designed to supply two process gases and generate corresponding plasmas using radio-frequency power.

Collaborations

Lee’s listed coworkers include Su Ji Gim and Dong Jun Ka. The available information does not specify their individual roles in the patent.

Conclusion

Woo Hyun Lee’s patent reflects work on plasma-based substrate treatment and cleaning equipment, with an emphasis on semiconductor manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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