Gyeonggi, South Korea

Woo-Hyun Kong

This inventor holds 1 USPTO granted patent. Top assignee: Amkor Technology, Inc.. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Woo-Hyun Kong. Retrieved from https://idiyas.com/inventor/woo-hyun-kong

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Woo-Hyun Kong: Innovator in Semiconductor Technology

Introduction

Woo-Hyun Kong is a notable inventor based in Kyunggi-do, South Korea. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods for enhancing circuit pattern applications.

Latest Patents

One of his key patents is titled "Method for laminating circuit pattern tape on semiconductor wafer." This patent describes a method for laminating a circuit pattern tape over a wafer. The process involves preparing a circuit pattern tape with an adhesive layer, detecting reference positions on both the tape and the wafer using visual detection means, and correcting the positions to ensure proper alignment before laminating the tape onto the wafer.

Career Highlights

Woo-Hyun Kong is currently employed at Amkor Technology, Inc., a leading provider of semiconductor packaging and test services. His work at Amkor has allowed him to focus on advancing technologies that improve the efficiency and effectiveness of semiconductor manufacturing.

Collaborations

He has collaborated with notable colleagues such as Ju-Hoon Yoon and Chang-Bok Lee, contributing to various projects that enhance semiconductor technologies.

Conclusion

Woo-Hyun Kong's innovative methods and contributions to semiconductor technology highlight his role as a key inventor in the industry. His work continues to influence advancements in the field, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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