Daejeon, South Korea

Wonoh Lee

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Plasmart Inc.. Active years: 2015-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wonoh Lee. Retrieved from https://idiyas.com/inventor/wonoh-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015-2016

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2 patents (USPTO):Explore Patents

Title: The Innovations of Wonoh Lee

Introduction

Wonoh Lee is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of technology, particularly in the development of devices that enhance radio frequency applications. With a total of 2 patents to his name, Lee continues to push the boundaries of innovation.

Latest Patents

Among his latest inventions is an impedance matching device. This device features a first variable capacitor connected to an RF power source, which includes a first shaft that moves linearly. Additionally, it incorporates a first linear motion unit that is axially coupled to the first shaft, providing essential linear motion. The design also includes a first insulating joint that connects the first shaft to a first driving shaft of the linear motion unit, along with a first displacement sensor that measures the movement distance of the driving shaft.

Career Highlights

Wonoh Lee is currently associated with Plasmart Inc., where he applies his expertise in developing advanced technological solutions. His work at the company reflects his commitment to innovation and excellence in engineering.

Conclusion

In summary, Wonoh Lee is a dedicated inventor whose work in impedance matching devices and linear motion technology showcases his innovative spirit. His contributions continue to impact the field positively, and his patents reflect his expertise and creativity.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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