Suwon, South Korea

Wonjun Yang

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wonjun Yang. Retrieved from https://idiyas.com/inventor/wonjun-yang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Wonjun Yang - Innovator in Overlay Measuring Method

Introduction

Wonjun Yang is an inventor based in Suwon-si, South Korea. He has made significant contributions to the field of overlay measurement technology. His innovative approach focuses on improving the accuracy and consistency of overlay measurements in various applications.

Latest Patent Applications

Wonjun Yang's notable patent application is titled "OVERLAY MEASURING METHOD." This application provides a method that includes setting an overlay offset on a substrate, obtaining a cell image by irradiating an electron beam, and acquiring both a first image of an upper pattern and a second image of a lower pattern based on the cell image. The method involves merging these images and measuring the overlay of the merged image. Additionally, it corrects a measuring parameter used in measuring the overlay to enhance consistency between the overlay offset and the measured result value of the overlay. The correction is based on a number of measuring failure values classified as measurement failures in the result values of the overlay.

Conclusion

Wonjun Yang's work in overlay measurement technology showcases his innovative spirit and dedication to enhancing measurement accuracy. His contributions are poised to impact the field significantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…