Suwon, South Korea

WonChan Lee

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2014.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Innovator Profile: WonChan Lee

Introduction

WonChan Lee is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative methods in process proximity correction. His work is essential for enhancing the precision and efficiency of etching processes in the industry.

Latest Patents

WonChan Lee holds a patent for a "Method for Process Proximity Correction." This patent outlines a comprehensive approach that includes obtaining a point spread function (PSF) from test patterns, generating a target layout with polygonal patterns, and creating a density map that incorporates long-range layout densities. The method also involves performing convolutions of these densities with the PSF to derive long-range etch skews, ultimately leading to the generation of an etch bias model.

Career Highlights

Currently, WonChan Lee is employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of innovation in semiconductor technology. His expertise in etching processes has positioned him as a valuable asset to the company and the industry at large.

Collaborations

Throughout his career, WonChan has collaborated with talented individuals such as Seong-Bo Shim and Sunghoon Jang. These collaborations have fostered an environment of innovation and have contributed to the advancement of their collective work in semiconductor manufacturing.

Conclusion

WonChan Lee's contributions to the field of semiconductor technology through his innovative patent and collaborative efforts highlight his importance as an inventor. His work continues to influence the industry and pave the way for future advancements.

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