Suwon, South Korea

Won-Jong Hwang

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Sdi Co., Inc.. Active years: 2019.


% Patents Active = 100.0

Average Co-Inventor Count = 21.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Innovator Profile: Won-Jong Hwang

Introduction

Won-Jong Hwang is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of organic layer structures, particularly through his innovative methods and techniques. His work is recognized for its potential applications in various technological advancements.

Latest Patents

Won-Jong Hwang holds a patent for a "Method of producing layer structure, layer structure, and method of forming patterns." This patent describes a method that includes forming a first organic layer by applying a first composition containing an organic compound on a substrate with multiple patterns. The process further involves applying a solvent to remove part of the first organic layer and then applying a second composition to form a second organic layer through a curing process. This innovative approach enhances the efficiency and effectiveness of layer structure production.

Career Highlights

Hwang is currently employed at Samsung SDI Co., Inc., where he continues to develop and refine his inventions. His work at this leading technology company allows him to collaborate with other talented professionals in the field.

Collaborations

Some of his notable coworkers include Yong-Woon Yoon and Sun-Hae Kang. Their collaborative efforts contribute to the advancement of technology and innovation within the company.

Conclusion

Won-Jong Hwang's contributions to the field of organic layer structures exemplify the spirit of innovation. His patent and ongoing work at Samsung SDI Co., Inc. highlight his role as a key figure in advancing technology.

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