This inventor holds 1 USPTO granted patent. Top assignee: Sungkyunkwan University. Active years: 2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2019
Title: Innovations of Won Jin Ban
Introduction
Won Jin Ban is an accomplished inventor based in Suwon, South Korea. He has made significant contributions to the field of plasma technology, particularly in the area of dielectric materials. His innovative methods have the potential to advance various applications in electronics and materials science.
Latest Patents
Won Jin Ban holds a patent for a "Method for generating plasma uniformly on dielectric material." This invention relates to a method for checking a discharge inception voltage of a dielectric material. It includes a process for forming a displacement field on dielectric materials by applying a voltage equal to or higher than the discharge inception voltage. Additionally, it describes a method for generating plasma on the surfaces of the dielectric material by injecting reaction gases and applying the necessary voltage. The invention also covers a dielectric material that has been modified through plasma treatment.
Career Highlights
Won Jin Ban is affiliated with Sungkyunkwan University, where he continues to engage in research and development. His work focuses on enhancing the understanding and application of plasma technology in various fields. He has successfully developed methods that improve the efficiency and uniformity of plasma generation.
Collaborations
Throughout his career, Won Jin Ban has collaborated with notable colleagues, including Dong Geun Jung and Yong Ki Cho. These collaborations have contributed to the advancement of research in plasma technology and its applications.
Conclusion
Won Jin Ban's innovative work in plasma technology and dielectric materials showcases his expertise and commitment to advancing scientific knowledge. His contributions are paving the way for future developments in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
