Seoul, South Korea

Won Ho Seo

This inventor holds 1 USPTO granted patent. Top assignee: Lg Electronics Inc.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Won Ho Seo. Retrieved from https://idiyas.com/inventor/won-ho-seo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Won Ho Seo

Introduction

Won Ho Seo is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of optical alignment technology. His work focuses on enhancing the precision of maskless exposure methods, which are crucial in various applications.

Latest Patents

Won Ho Seo holds a patent for a "Method and apparatus to adjust misalignment of the maskless exposure apparatus." This innovative method allows for more precise optical alignment using a first pattern of a maskless exposure part and a second pattern of a main reference unit. Additionally, it reduces the generation of blur in the exposed pattern, showcasing his commitment to advancing technology in this area. He has 1 patent to his name.

Career Highlights

Seo is currently employed at LG Electronics Inc., where he continues to develop and refine technologies that impact the electronics industry. His work at LG Electronics has positioned him as a key player in the advancement of optical technologies.

Collaborations

Throughout his career, Won Ho Seo has collaborated with notable colleagues, including Myung Ju Park and Tae Ho Lee. These collaborations have further enriched his work and contributed to the success of various projects.

Conclusion

Won Ho Seo's innovative approach to optical alignment and his contributions to maskless exposure technology highlight his importance in the field. His work not only enhances precision but also reduces errors in exposure patterns, making a significant impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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