The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2013
Filed:
Jun. 25, 2008
Applicants:
Young Hoon Shin, Seocho-gu, KR;
Won Ho Seo, Seocho-gu, KR;
Myung Ju Park, Seocho-gu, KR;
Hyung Jin Lee, Seocho-gu, KR;
Sang Hwan Cha, Seocho-gu, KR;
Tae Ho Lee, Seocho-gu, KR;
Chang Ju Rhee, Seocho-gu, KR;
Inventors:
Young Hoon Shin, Seocho-gu, KR;
Won Ho Seo, Seocho-gu, KR;
Myung Ju Park, Seocho-gu, KR;
Hyung Jin Lee, Seocho-gu, KR;
Sang Hwan Cha, Seocho-gu, KR;
Tae Ho Lee, Seocho-gu, KR;
Chang Ju Rhee, Seocho-gu, KR;
Assignee:
LG Electronics Inc., Seoul, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/68 (2006.01); G03B 27/42 (2006.01); G03B 27/32 (2006.01); G03B 27/52 (2006.01); G03B 27/58 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed is a maskless exposure method, where it is possible to perform a more precise optical alignment using a first pattern of a maskless exposure part and a second pattern of a main reference unit, and it is also possible to reduce generation of a blur in an exposed pattern.