Seoul, South Korea

Chang Ju Rhee

This inventor holds 1 USPTO granted patent. Top assignee: Lg Electronics Inc.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chang Ju Rhee. Retrieved from https://idiyas.com/inventor/chang-ju-rhee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Chang Ju Rhee: Innovator in Maskless Exposure Technology

Introduction

Chang Ju Rhee is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of optical alignment through his innovative work in maskless exposure technology. His expertise and dedication to advancing technology have led to the development of a unique patent that addresses critical challenges in the industry.

Latest Patents

Chang Ju Rhee holds a patent titled "Method and apparatus to adjust misalignment of the maskless exposure apparatus." This invention discloses a maskless exposure method that enables more precise optical alignment using a first pattern of a maskless exposure part and a second pattern of a main reference unit. Additionally, it reduces the generation of blur in the exposed pattern, enhancing the overall quality of the exposure process. He has 1 patent to his name.

Career Highlights

Chang Ju Rhee is currently employed at LG Electronics Inc., a leading global company known for its innovative technology solutions. His work at LG Electronics has allowed him to collaborate with other talented professionals in the field, further enhancing his contributions to technology.

Collaborations

Some of his notable coworkers include Young Hoon Shin and Myung Ju Park. Their collaborative efforts have played a vital role in advancing the projects they work on together.

Conclusion

Chang Ju Rhee's innovative approach to maskless exposure technology exemplifies the impact of dedicated inventors in the field. His contributions continue to shape the future of optical alignment and exposure methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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