Gimhae, South Korea

Won-ha Choi

This inventor holds 1 USPTO granted patent. Top assignee: Lacomm Co., Ltd.. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Won-ha Choi. Retrieved from https://idiyas.com/inventor/won-ha-choi-rqlujy7u

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Won-ha Choi

Introduction

Won-ha Choi is a notable inventor based in Gimhae, South Korea. He has made significant contributions to the field of magnetic flux density technology. His work focuses on detecting internal cracks in metals, which is crucial for various industrial applications.

Latest Patents

Won-ha Choi holds a patent for a "Magnetic flux density apparatus for detecting an internal crack of a metal or a shape of the metal." This innovative device includes a three-dimensional magnetic flux focusing unit that concentrates magnetic flux generated by the metal. Additionally, it features a magnetic flux density measurement unit that measures changes in magnetic flux density. The display unit is electrically connected to the measurement unit, allowing for real-time display and storage of changes in magnetic flux density.

Career Highlights

Choi is currently employed at Lacomm Co., Ltd., where he continues to develop and refine his inventions. His work has garnered attention for its practical applications in ensuring the integrity of metal structures.

Collaborations

Some of his coworkers include Jin-yi Lee and Min-soo Kim, who contribute to the innovative environment at Lacomm Co., Ltd.

Conclusion

Won-ha Choi's contributions to magnetic flux density technology exemplify the importance of innovation in industrial applications. His patent reflects a commitment to enhancing safety and efficiency in metal detection.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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