Company Filing History:
Years Active: 1993-1996
Title: Wolfram Schock: Innovator in Gas Discharge Technologies
Introduction
Wolfram Schock is a notable inventor based in Böblingen, Germany. He has made significant contributions to the field of gas discharge technologies, holding a total of three patents. His work focuses on improving the efficiency and functionality of gas discharge structures and lasers.
Latest Patents
One of his latest patents is for a gas discharge structure designed to produce two-dimensionally extending gas discharges. This invention includes a pair of electrodes with mutually facing surfaces and a gas discharge space filled with plasma gas. The structure utilizes a high-frequency source to feed current into the electrodes, ensuring that wavelength-dependent modulations of the field strength are minimized. The first electrode's surface is divided into two electrically separated partial surfaces, allowing for a surface current to flow effectively.
Another significant patent is for a gasdynamic CO laser. This invention aims to enhance the excitation of laser gas within the laser system. It features a high-frequency discharge region that optimally excites the laser gas before it flows through a supersonic nozzle. This innovation improves the overall efficiency of the laser system.
Career Highlights
Wolfram Schock has worked with prominent organizations, including the German Aerospace Center (Deutsche Forschungsanstalt für Luft- und Raumfahrt e.V.) and Rofin-Sinar Laser GmbH. His experience in these institutions has allowed him to develop and refine his innovative technologies.
Collaborations
Throughout his career, Schock has collaborated with notable colleagues such as Hartwig Von Bülow and Hansjoerg Bochum. These partnerships have contributed to the advancement of his research and inventions.
Conclusion
Wolfram Schock's contributions to gas discharge technologies and laser systems have made a significant impact in the field. His innovative patents reflect his dedication to enhancing the efficiency and functionality of these technologies.
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