This inventor holds 2 USPTO granted patents. Top assignees: Max-Planck-Gesellschaft Zur Förderung Der Wissenschaften E. V. , Rohm Gmbh. Active years: 1985-1986.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 1,333 
1 out of 596 
Years Active: 1985-1986
Title: Wolfram Schnabel: Innovator in Radiation Sensitive Materials
Introduction
Wolfram Schnabel is a prominent inventor based in Berlin, Germany, known for his significant contributions to the field of polymer science and semiconductor technology. With two patents to his name, he has made remarkable strides in the development of materials that are critical for advanced manufacturing processes.
Latest Patents
Schnabel's latest patents highlight his innovative spirit and technical expertise. The first patent, titled "Radiation Sensitive Polymeric Material," describes a copolymer of methyl methacrylate and allyl methacrylate combined with organosulfur compounds featuring multiple thiol groups. This radiation-sensitive material serves as a polymer resist that is adept at coping with high-energy radiation. His second patent focuses on "Positive Resist Material," which involves thermally crosslinkable methacrylic polymers that are soluble in organic solvents. These polymers consist of copolymers primarily made up of fluoroalkylmethacrylate and methacrylic acid chloride or chloroalkylmethacrylate, making them particularly effective in semiconductor technology for transferring microstructures.
Career Highlights
Wolfram Schnabel has had a noteworthy career, having worked with esteemed organizations such as the Max Planck Society for the Advancement of Science and Rohm GmbH. These experiences have enabled him to hone his skills and focus on pushing the boundaries of material science.
Collaborations
Throughout his career, Schnabel collaborated with talented individuals, including Frithjof Asmussen and Hideto Sotobayashi. These collaborations have allowed for the exchange of ideas and the advancement of innovative projects, further driving his research in radiation-sensitive materials.
Conclusion
Wolfram Schnabel is an inspiring figure in the realm of polymer science and semiconductor technology. His patents not only represent innovative breakthroughs but also contribute significantly to progress in the industry. As he continues to push the frontiers of material development, his work remains impactful for future technological advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile