Wolfgang Zirkel

Title: Wolfgang Zirkel: Innovator in Reactive Vapor Deposition Technology

Introduction

Wolfgang Zirkel is a notable inventor based in Linsengericht, Germany. He has made significant contributions to the field of vapor deposition technology, particularly through his innovative methods for depositing metal compounds.

Latest Patents

Zirkel holds a patent for a "Method and apparatus for the reactive vapor depositing of metal compounds." This invention involves a method and apparatus for the reactive deposition of vapors of metal compounds onto substrates. The process utilizes the evaporation of at least one metal via an electron beam in a controlled atmosphere with reaction gas at pressures not exceeding 10^-1 mbar. An electrode, positively biased with respect to ground and operating at an acceleration voltage of at least 20 kV, is strategically placed in the vapor stream directed toward the substrate. The metal vapor is generated in an internal chamber surrounding the evaporator, which features a masked orifice opposite the substrate. The reaction gas is introduced into this chamber, guiding both the metal vapor and reaction gas toward the substrate through the masked orifice.

Career Highlights

Zirkel is associated with Leybold-Heraeus GmbH, a company known for its advancements in vacuum technology and thin film deposition. His work has been instrumental in enhancing the efficiency and effectiveness of vapor deposition processes.

Collaborations

Throughout his career, Wolfgang Zirkel has collaborated with notable colleagues, including Volker Bauer and Albert Feuerstein. These partnerships have contributed to the development and refinement of innovative technologies in their field.

Conclusion

Wolfgang Zirkel's contributions to the field of reactive vapor deposition have paved the way for advancements in material science and engineering. His innovative methods continue to influence the industry and inspire future research.