The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 1989
Filed:
Sep. 11, 1986
Volker Bauer, Neuberg, DE;
Albert Feuerstein, Neuberg, DE;
Klaus Hartig, Ronneburg, DE;
Gerhard Kienel, Hanau, DE;
Helmuth Lammermann, Alzenau, DE;
Wolfgang Zirkel, Linsengericht, DE;
Leybold-Heraeus GmbH, Cologne, DE;
Abstract
A method and apparatus is disclosed for the reactive deposition of vapors of metal compounds onto substrates by the evaporation of at least one metal by means of an electron beam in an atmosphere consisting of the reaction gas, at pressures of no more than 10.sup.-1 mbar. An electrode positively biased with respect to ground and having an acceleration voltage of at least 20 kV is disposed in the area of the vapor stream flowing to the substrate. The metal vapor is produced in an internal chamber which surrounds the evaporator and has a masked orifice opposite the substrate. The reaction gas is introduced into the internal chamber and the metal vapor and reaction gas are guided by the masked orifice toward the substrate.