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For the Inventor, By the Inventor

Eltville, Germany

Wolfgang Zahn

This inventor holds 9 USPTO granted patents. Top assignees: Hoechst Aktiengesellschaft, Az Electronic Materials USA Corp.. Active years: 1988-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wolfgang Zahn. Retrieved from https://idiyas.com/inventor/wolfgang-zahn-wlp40cre

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 9

% Patents Active = 88.9

Average Co-Inventor Count = 3.3

ph-index = 3

Forward Citations = 25(Granted Patents)


Location History:

  • Eltville-Erbach, DE (1988)
  • Eltville, DE (1990 - 2011)

Company Filing History:

goldMedal8 out of 6,705 
 
Hoechst Aktiengesellschaft
 patents
silverMedal1 out of 115 
 
Az Electronic Materials USA Corp.
 patents

Years Active: 1988-2011

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9 patents (USPTO):Explore Patents
1. 8012664 - Light-sensitive component for use in photoresists (2011-09-06),
2. 5563018 - (1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sensitive (1996-10-08),
3. 5413899 - Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfonic (1995-05-09),
4. 5358823 - Radiation-sensitive composition containing esterification product of (1994-10-25),
5. 5306595 - Composition containing naphthoquinone diazide sulfonic acid mixed esters (1994-04-26),
6. 5268252 - Radiation-sensitive ester and process for its preparation (1993-12-07),
7. 5162190 - 1,2-naphthoquinone-2-diazide-sulfonic acid amides and photosensitive (1992-11-10),
8. 4971887 - Positive-working photosensitive mixture and recording material of high (1990-11-20),
9. 4774171 - Bis-1,2-naphthoquinone-2-diazide-sulfonic acid amides, their use in a (1988-09-27),

Title: Wolfgang Zahn: Innovator in Photoresist Technology

Introduction

Wolfgang Zahn is a notable inventor based in Eltville, Germany. He has made significant contributions to the field of photoresist technology, holding a total of nine patents. His work has had a profound impact on the development of light-sensitive components used in various applications.

Latest Patents

Among his latest patents is a light-sensitive component designed for use in photoresists. This invention involves a compound of the formula (I), where the symbols and indices are defined in detail. Another significant patent relates to a radiation-sensitive mixture that includes 2,3,4-trihydroxy-3'-methyl-, -ethyl-, -propyl-, or -isopropylbenzophenone, which is completely esterified with (1,2-naphthoquinone 2-diazide)-4-sulfonic acid and/or (7-methoxy-1,2-naphthoquinone 2-diazide)-4-sulfonic acid. This mixture is crucial for creating a radiation-sensitive recording material that comprises a substrate and a radiation-sensitive layer.

Career Highlights

Wolfgang Zahn has had a distinguished career, working with prominent companies in the industry. He has been associated with Hoechst Aktiengesellschaft and Az Electronic Materials USA Corp., where he contributed to advancements in materials science and technology.

Collaborations

Throughout his career, Wolfgang has collaborated with notable professionals, including Gerhard Buhr and Axel Schmitt. These collaborations have further enriched his work and innovations in the field.

Conclusion

Wolfgang Zahn's contributions to photoresist technology and his numerous patents highlight his role as a leading inventor in the industry. His work continues to influence advancements in light-sensitive materials and applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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