Berlin, Germany

Wolfgang Ptak

This inventor holds 1 USPTO granted patent. Top assignee: Atotech Deutschland Gmbh. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wolfgang Ptak. Retrieved from https://idiyas.com/inventor/wolfgang-ptak

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Wolfgang Ptak: Innovator in Metal Structure Manufacturing

Introduction

Wolfgang Ptak is a notable inventor based in Berlin, Germany. He has made significant contributions to the field of manufacturing pattern-forming metal structures on carrier substrates. His innovative methods aim to enhance the transmission properties of antennae, particularly those used in the UHF range.

Latest Patents

Wolfgang Ptak holds a patent for a method of manufacturing pattern-forming metal structures on a carrier substrate. This method involves several steps, including providing the carrier substrate, forming the pattern with a composite material containing dispersed metal, bringing the substrate into contact with halide ions, and depositing a metal layer onto the formed pattern. This process results in the production of advanced metal structures that improve antenna performance.

Career Highlights

Wolfgang Ptak is associated with Atotech Deutschland GmbH, a company known for its expertise in surface finishing and specialty chemicals. His work at Atotech has allowed him to focus on innovative solutions in metal structure manufacturing.

Collaborations

Wolfgang has collaborated with notable colleagues, including Franz Kohnle and Michael Guggemos. Their combined expertise contributes to the advancement of technologies in their field.

Conclusion

Wolfgang Ptak's contributions to the manufacturing of metal structures have paved the way for improved antenna technologies. His innovative methods and collaborations continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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