Stadthagen, Germany

Wolfgang Hasse

This inventor holds 2 USPTO granted patents. Top assignee: Infineon Technologies Ag. Active years: 2014-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wolfgang Hasse. Retrieved from https://idiyas.com/inventor/wolfgang-hasse

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 50.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2014-2017

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2 patents (USPTO):Explore Patents

Title: Wolfgang Hasse: Innovator in Integrated Circuit Technology

Introduction

Wolfgang Hasse is a notable inventor based in Stadthagen, Germany. He has made significant contributions to the field of integrated circuit technology, holding 2 patents that showcase his innovative approach to circuit arrangements and production methods.

Latest Patents

Hasse's latest patents include advancements in long-term heat-treated integrated circuit arrangements and methods for producing the same. These patents detail methods in which barrier material is effectively removed at either the via bottom or via top area through long-term heat treatment. Additionally, his work allows for the coating of interconnects with barrier material in a straightforward manner, utilizing the same long-term heat treatment process.

Career Highlights

Wolfgang Hasse is currently employed at Infineon Technologies AG, where he continues to push the boundaries of technology in integrated circuits. His expertise and innovative mindset have positioned him as a key player in the industry.

Collaborations

Hasse collaborates with talented coworkers such as Oliver Aubel and Martina Hommel, contributing to a dynamic team focused on advancing integrated circuit technology.

Conclusion

Wolfgang Hasse's contributions to integrated circuit technology through his patents and work at Infineon Technologies AG highlight his role as an influential inventor in the field. His innovative methods and collaborative spirit continue to drive advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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