This inventor holds 1 USPTO granted patent. Top assignee: Infineon Technologies Ag. Active years: 2006.
Company Filing History:
Years Active: 2006
Title: Innovations by Wolfgang Dettman in Photomask Technology
Introduction
Wolfgang Dettman is a notable inventor based in Munich, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the area of photomasks. His innovative work has led to advancements that are crucial for the production of semiconductor devices.
Latest Patents
Dettman holds a patent for a photomask, specifically an alternating phase shift mask with a compensation structure. This invention relates to a method for producing masks, including alternating phase shift masks, chromeless phase shift masks, and phase shift masks structured by quartz etching. The patent describes a photomask designed for semiconductor device production, which includes at least one product field area and a compensation structure positioned outside this area. The compensation structure features at least one electroconductive region that is electrically connected to the product field area.
Career Highlights
Wolfgang Dettman is associated with Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has allowed him to apply his innovative ideas in a practical setting, contributing to the company's advancements in technology.
Collaborations
Dettman has collaborated with notable colleagues such as Josef Mathuni and Oliver Fagerer. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the semiconductor industry.
Conclusion
Wolfgang Dettman's contributions to photomask technology exemplify the importance of innovation in the semiconductor field. His patent and work at Infineon Technologies AG highlight his role as a key inventor in advancing semiconductor manufacturing processes.