The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2006
Filed:
Sep. 22, 2003
Wolfgang Dettman, Munich, DE;
Josef Mathuni, Munich, DE;
Oliver Fagerer, Dietramszell, DE;
Bettina Schiessl, Aschheim, DE;
Stephen Rahn, Hoehenkirch-Siegertsbrunn, DE;
Wolfgang Dettman, Munich, DE;
Josef Mathuni, Munich, DE;
Oliver Fagerer, Dietramszell, DE;
Bettina Schiessl, Aschheim, DE;
Stephen Rahn, Hoehenkirch-Siegertsbrunn, DE;
Infineon Technologies AG, , DE;
Abstract
The invention relates to a method for the production of masks, in particular for the production of alternating phase shift masks (), or of chromeless phase shift masks or phase shift masks structured by quartz etching, respectively, as well as to a mask (), in particular photomask, for the production of semiconductor devices, comprising at least one product field area () and a compensation structure () positioned outside the product field area (), wherein the compensation structure () comprises at least one electroconductive region () that is electrically connected with the product field area ().