Bettina Schiessl

Title: Bettina Schiessl: Innovator in Photomask Technology

Introduction

Bettina Schiessl is a prominent inventor based in Aschheim, Germany. She has made significant contributions to the field of semiconductor device manufacturing through her innovative work in photomask technology. Her expertise and dedication have led to the development of a unique patent that enhances the production of advanced masks used in semiconductor fabrication.

Latest Patents

Bettina Schiessl holds a patent for a "Photomask, in particular alternating phase shift mask, with compensation structure." This invention relates to a method for producing masks, specifically alternating phase shift masks, chromeless phase shift masks, or phase shift masks structured by quartz etching. The patent describes a photomask designed for semiconductor device production, which includes at least one product field area and a compensation structure positioned outside the product field area. The compensation structure features at least one electroconductive region that is electrically connected to the product field area.

Career Highlights

Bettina Schiessl is associated with Infineon Technologies AG, a leading company in the semiconductor industry. Her work at Infineon has allowed her to apply her innovative ideas in a practical setting, contributing to the advancement of semiconductor technologies.

Collaborations

Throughout her career, Bettina has collaborated with notable colleagues, including Wolfgang Dettman and Josef Mathuni. These collaborations have fostered an environment of innovation and have led to the successful development of cutting-edge technologies in the semiconductor field.

Conclusion

Bettina Schiessl's contributions to photomask technology exemplify her commitment to innovation in the semiconductor industry. Her patent and collaborative efforts highlight her role as a key player in advancing semiconductor manufacturing processes.