Oliver Fagerer

Title: Oliver Fagerer: Innovator in Photomask Technology

Introduction

Oliver Fagerer is a notable inventor based in Dietramszell, Germany. He has made significant contributions to the field of semiconductor device manufacturing through his innovative work on photomasks. His expertise and inventions have played a crucial role in advancing technology in this area.

Latest Patents

Oliver Fagerer holds a patent for a photomask, specifically an alternating phase shift mask with a compensation structure. This invention relates to a method for producing masks, particularly for creating alternating phase shift masks, chromeless phase shift masks, or phase shift masks structured by quartz etching. The patent describes a photomask designed for semiconductor device production, which includes at least one product field area and a compensation structure positioned outside this area. The compensation structure features at least one electroconductive region that is electrically connected to the product field area.

Career Highlights

Fagerer is associated with Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has allowed him to contribute to cutting-edge technologies that are essential for modern electronics. His innovative approach has garnered attention in the industry, showcasing his skills as an inventor.

Collaborations

Throughout his career, Oliver Fagerer has collaborated with notable colleagues, including Wolfgang Dettman and Josef Mathuni. These collaborations have further enhanced his work and contributed to the development of advanced technologies in the semiconductor field.

Conclusion

Oliver Fagerer is a distinguished inventor whose work in photomask technology has made a significant impact on the semiconductor industry. His innovative patent and contributions to Infineon Technologies AG highlight his role as a key player in advancing technology.