Company Filing History:
Years Active: 2019-2020
Title: Innovations of Wilson Hsieh in IC Manufacturing
Introduction
Wilson Hsieh is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of integrated circuit (IC) manufacturing. With a total of 2 patents, Hsieh's work focuses on enhancing the efficiency and precision of IC fabrication processes.
Latest Patents
Hsieh's latest patents include a method and structure for mandrel and spacer patterning. This innovative IC manufacturing method involves forming first and second mandrels over a substrate. It also includes the formation of first spacers on the sidewalls of the first mandrels and second spacers on the sidewalls of the second mandrels. Each of these spacers features a loop structure with two curvy portions connected by two lines. The method further entails removing the first and second mandrels, as well as selectively removing the curvy portions from each of the first spacers without affecting the second spacers. The second spacers play a crucial role in monitoring variations in the IC fabrication processes.
Career Highlights
Wilson Hsieh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading entity in the semiconductor industry. His work at this prestigious company has allowed him to collaborate with other talented professionals in the field.
Collaborations
Some of Hsieh's notable coworkers include Chi-Che Tseng and Chen-Yuan Wang. Their collaborative efforts contribute to the advancement of IC manufacturing technologies.
Conclusion
Wilson Hsieh's innovative contributions to IC manufacturing demonstrate his expertise and commitment to advancing technology in this critical field. His patents reflect a deep understanding of the complexities involved in semiconductor fabrication processes.