William W Dostalik, Jr

Title: William W. Dostalik, Jr.: Innovator in Substrate Etching Technologies

Introduction

William W. Dostalik, Jr. is a notable inventor based in Plano, TX, USA. He has made significant contributions to the field of integrated circuit fabrication through his innovative methods for substrate etching. With two patents to his name, his work focuses on enhancing the efficiency and precision of semiconductor processes.

Latest Patents

One of Dostalik’s latest patents, titled "Method for Etching a Substrate and a Device Formed Using the Method," presents a novel approach for etching that involves a substrate with an aluminum oxide etch stop layer. This method utilizes an etchant containing carbon oxide and a fluorocarbon, achieving a selective etch that is essential in advanced CMOS processes. It also specifies precise flow rates of the etchants, showcasing the level of detail in his innovative designs.

Another patent, "Method for Line Etch Roughness (LER) Reduction for Low-k Interconnect Damascene Trench Etching," outlines a dual-etch approach. The first etch selectively targets an anti-reflective layer and a portion of a hardmask, while the second etch, less selective, allows for the buildup of beneficial polymer on the sidewalls during the process. This method aims to improve the performance of low-k interconnects, addressing a critical challenge in semiconductor manufacturing.

Career Highlights

William W. Dostalik, Jr. is currently employed at Texas Instruments Corporation, a leading company in the electronics and semiconductor industry. His career is marked by a commitment to advancing technologies in the field, ensuring high precision and optimized fabrication processes.

Collaborations

Throughout his career, Dostalik has collaborated with talented colleagues, including Kezhakkedath Ramunni Udayakumar and Ted S. Moise. These collaborations have further contributed to the innovative solutions being developed within the semiconductor field, showcasing the importance of teamwork in technological advancements.

Conclusion

William W. Dostalik, Jr. stands out as an important figure in semiconductor innovation. His patents reflect a deep understanding of substrate etching techniques and their application in integrated circuit manufacturing. As he continues his work at Texas Instruments Corporation, his contributions are likely to have a lasting impact on the industry.