The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2007
Filed:
Sep. 28, 2004
William W. Dostalik, Jr., Plano, TX (US);
William W. Dostalik, Jr., Plano, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
The present invention provides a method for etching a substrate. The method includes conducting a first etch on an anti-reflective layerand a portion of a hardmask layerto form an openingin the substrate. The first etch is designed to be selective to a remaining portion of the hardmask layer. A second etch, which is different from the first etch, is conducted on a remaining portion of the hardmask, and it is designed to be less selective than the first etch to the remaining portion of the hardmask. The first etch allows polymer to build up on the sidewalls of the opening, and the polymer substantially remains on the sidewalls during the second etch.