Shelton, CT, United States of America

William Stephen Kosh



Average Co-Inventor Count = 1.4

ph-index = 4

Forward Citations = 92(Granted Patents)


Location History:

  • Shelton, CT (US) (1982 - 2007)
  • Shelton, UT (US) (2007)

Company Filing History:


Years Active: 1982-2007

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8 patents (USPTO):Explore Patents

Title: William Stephen Kosh: Innovator in Pressure Measurement Technology

Introduction

William Stephen Kosh is a notable inventor based in Shelton, CT, with a remarkable portfolio of eight patents. His work primarily focuses on advancements in pressure measurement systems, showcasing his commitment to innovation and engineering excellence.

Latest Patents

Kosh's latest patents include a system and method for pressure measurement that enhances manufacturing reliability and performance. This innovative pressure measurement system features a circuit board housing that integrates a pressure inlet joint and a pressure detecting component. The design allows for efficient signal conditioning from the pressure detecting component, ensuring accurate pressure readings. The cylindrical circuit board housing is specifically designed to accommodate the pressure inlet joint and the circuit board, optimizing the overall functionality of the system.

Career Highlights

Throughout his career, Kosh has made significant contributions to the field of pressure measurement technology. He has worked with reputable companies such as Dresser Industries, Inc. and Ashcroft-Nagano, Inc., where he applied his expertise to develop cutting-edge solutions in pressure measurement.

Collaborations

Kosh has collaborated with talented professionals in the industry, including Yoshikazu Kaneko and Mehdi Golafshani. These partnerships have further enriched his work and contributed to the advancement of pressure measurement technologies.

Conclusion

William Stephen Kosh stands out as an influential inventor in the realm of pressure measurement systems. His innovative patents and collaborative efforts reflect his dedication to enhancing technology in this critical field.

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