Company Filing History:
Years Active: 1995-2016
Title: The Innovations of William McClure Hooke
Introduction
William McClure Hooke is a notable inventor based in Chapel Hill, NC, with a remarkable portfolio of eight patents. His work primarily focuses on plasma generation systems, showcasing his expertise in electrical engineering and applied physics. Hooke's inventions have contributed significantly to advancements in plasma technology.
Latest Patents
Among his latest patents is the "Self-tuned dielectric barrier discharge," which describes a plasma generating system. This system features a pair of electrodes spaced apart by an electrode gap, with a gas source designed to fill this gap. A power generating circuit is connected to the electrodes, creating an electric field that initiates a plasma discharge. The circuit is engineered to maintain a sufficient electric field during the discharge, allowing the plasma impedance to self-tune to the system. Another significant patent is the "Pulsed dielectric barrier discharge," which outlines a method for generating glow discharge plasma. This method involves a pair of electrodes with a dielectric in the gap, where a rapid rise time voltage pulse is applied to create an extreme overvoltage condition before current flow occurs.
Career Highlights
William McClure Hooke has had a distinguished career, working with reputable organizations such as the International Technology Center and the University of North Carolina at Chapel Hill. His contributions to these institutions have been instrumental in advancing research and development in plasma technologies.
Collaborations
Throughout his career, Hooke has collaborated with notable colleagues, including Allen Richard Martin and Mark Alan Ray. These partnerships have fostered innovation and have led to significant advancements in their respective fields.
Conclusion
William McClure Hooke's contributions to plasma technology through his patents and collaborations highlight his role as a leading inventor in this domain. His work continues to influence advancements in electrical engineering and applied physics.