The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2009
Filed:
Oct. 30, 2007
William Mcclure Hooke, Chapel Hill, NC (US);
Allen Richard Martin, Sanford, NC (US);
Mark Alan Ray, Raleigh, NC (US);
William McClure Hooke, Chapel Hill, NC (US);
Allen Richard Martin, Sanford, NC (US);
Mark Alan Ray, Raleigh, NC (US);
International Technology Center, Raleigh, NC (US);
Abstract
A method of generating a fast-rise time voltage step to produce an overvoltage condition for a dielectric barrier plasma discharge involves providing a pair of electrodes spaced apart by an electrode gap and at least one dielectric disposed in the gap; generating fast-rise time voltage step such that the rise time to achieve said overvoltage condition is equal to or less than the time required to generate the plasma thereby establishing the overvoltage condition prior to current flow across said electrode gap. Power from storage capacitor banks discharge into the electrode gap through a switch. The switch is capable of standing-off voltage sufficient to create the overvoltage condition when the switch is open. The discharge current pulse across the said electrode gap is terminated by charging properties of the said dielectric(s) in the said electrode gap. This abstract is not to be considered limiting, since other embodiments may deviate from the features described in this abstract.