Company Filing History:
Years Active: 2002-2010
Title: William Max Coppock: Innovator in Thin Film Resistor Technology
Introduction
William Max Coppock is a notable inventor based in Arlington, TX (US). He has made significant contributions to the field of integrated circuit technology, holding a total of 12 patents. His work primarily focuses on advancements in thin film resistors and anti-fuse technologies.
Latest Patents
Coppock's latest patents include a "System and method for providing a buried thin film resistor having end caps defined by a dielectric mask." This invention discloses a buried thin film resistor formed on an integrated circuit substrate, with a resistor protect layer and dielectric material strategically applied to enhance performance. Another significant patent is the "Method of forming a silicide bridged anti-fuse with a tungsten plug metalization process." This innovation allows for the integration of anti-fuses into electrical circuits without incurring additional costs, streamlining the manufacturing process.
Career Highlights
William Max Coppock has had a distinguished career at National Semiconductor Corporation, where he has been instrumental in developing cutting-edge technologies. His expertise in thin film resistors and anti-fuse designs has positioned him as a key player in the semiconductor industry.
Collaborations
Coppock has collaborated with notable colleagues, including Charles A Dark and Victor Torres. Their combined efforts have led to advancements in semiconductor technologies and have contributed to the success of their projects.
Conclusion
William Max Coppock's innovative work in the field of integrated circuits and his numerous patents highlight his significant impact on technology. His contributions continue to influence the development of semiconductor devices, showcasing the importance of innovation in this rapidly evolving industry.