William M Holber

Title: William M Holber: Pioneering Innovator in the World of Patents and Inventions

Introduction:

William M Holber, a visionary inventor based in New York, NY, has left an indelible mark on the field of patents and inventions through his unwavering passion for innovation and relentless pursuit of excellence. With a total of 4 patents to his name, Holber's groundbreaking work continues to inspire the next generation of inventors.

Latest Patents:

1. Etching of silicon dioxide selectively to silicon nitride and polysilicon - Holber's innovative method involves the directional etching of silicon dioxide on a substrate using a hydrogen halide plasma. This process selectively etches silicon dioxide relative to polysilicon and silicon nitride, resulting in an anisotropic product.

2. Method and apparatus for filing high aspect patterns with metal - Holber's patent introduces an electron cyclotron resonance plasma heating apparatus system and process for filling high aspect patterns with metal. By generating energetic electrons through microwave energy transmission and ionizing metal atoms in an evacuated chamber, this method enables precise metal deposition on substrates.

Career Highlights:

William M Holber is a valued member of the International Business Machines Corporation (IBM), where his innovative spirit and technical expertise have contributed significantly to the company's research and development efforts. Holber's dedication to pushing the boundaries of technology has led to the successful implementation of cutting-edge solutions in the semiconductor industry.

Collaborations:

Throughout his career, Holber has collaborated closely with esteemed colleagues such as Joseph S Logan and Michael S Barnes. Together, they have synergized their talents and expertise to tackle complex challenges in the field of semiconductor technology, resulting in groundbreaking innovations that have garnered international recognition.

Conclusion:

In conclusion, William M Holber's relentless pursuit of innovation and his commitment to excellence have cemented his legacy as a pioneering inventor in the realm of patents and inventions. His innovative contributions to the semiconductor industry continue to shape the landscape of technology, inspiring future generations to push the boundaries of what is possible.