The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 1993
Filed:
Jun. 23, 1992
Applicant:
Inventors:
John C Forster, Poughkeepsie, NY (US);
William M Holber, New York, NY (US);
Joseph S Logan, Poughkeepsie, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; H05H / ;
U.S. Cl.
CPC ...
31511141 ; 31511121 ; 20429816 ; 20429837 ; 20429838 ;
Abstract
Electron cyclotron apparatus is described in which the locus of cyclotron resonance is scanned away from and toward the axis of a magnetic field by varying the strength of the magnetic field, the frequency of electromagnetic waves passing along its axis, or both.
Forster, John. (1993). Scanned electron cyclotron resonance plasma source (U.S. Patent No. 5208512). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5208512
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile