William L Wilson, Jr

This inventor holds 4 USPTO granted patents. Top assignees: Texas Instruments Corporation, United Technologies Corporation. Active years: 1987-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: William L Wilson, Jr. Retrieved from https://idiyas.com/inventor/william-l-wilson-jr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 6(Granted Patents)

Company Filing History:

2 out of 29,888

Texas Instruments Corporation

patents

2 out of 10,655

United Technologies Corporation

patents

Years Active: 1987-2004

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4 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6741333 - Multiple image photolithography system and method (2004-05-25),

2. 6567153 - Multiple image photolithography system and method (2003-05-20),

3. 4660210 - Two-halogen donor mixture for XeF (C.fwdarw.A) laser (1987-04-21),

4. 4646311 - Multi-component buffer gas mixture for XeF(C.fwdarw.A) laser (1987-02-24),

Title: The Innovations of William L Wilson, Jr.

Introduction

William L Wilson, Jr. is a notable inventor based in Houston, TX (US). He has made significant contributions to the field of photolithography, holding a total of 4 patents. His work has been instrumental in advancing technologies that rely on precise imaging and radiation techniques.

Latest Patents

One of his latest patents is a multiple image photolithography system and method. This innovative system includes a radiation source that projects electromagnetic radiation along a defined path. A reticle cartridge is strategically placed in the path of the projected radiation, which contains a photomask and a Fabry-Perot interferometer. Additionally, a radiation-sensitive material is positioned in such a way that the projected radiation encounters the reticle cartridge before reaching the sensitive material. This design enhances the efficiency and effectiveness of photolithography processes.

Career Highlights

Throughout his career, William L Wilson, Jr. has worked with prominent companies such as United Technologies Corporation and Texas Instruments Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to the advancement of technology in various sectors.

Collaborations

Some of his notable coworkers include Frank K Tittel and William L Nighan. Their collaborative efforts have likely played a role in the successful development of his patents and innovations.

Conclusion

William L Wilson, Jr. is a distinguished inventor whose work in photolithography has made a lasting impact on the field. His patents reflect a commitment to innovation and technological advancement.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]