The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2003
Filed:
Oct. 19, 2000
Michael C. Smayling, Sunnyvale, CA (US);
Frank Tittel, Houston, TX (US);
William L. Wilson, Jr., Houston, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A multiple image photolithography system includes a radiation source ( ) projecting electromagnetic radiation along a path. A reticle cartridge ( ) is located in the path of the projected radiation. The cartridge ( ) includes a photomask ( ) located in the path of the projected radiation and a Fabry-Perot interferometer ( ) located in the path of the projected radiation. A radiation-sensitive material ( ) is located in the path of the projected radiation such that the projected radiation encounters the reticle cartridge ( ) before the projected radiation encounters the radiation-sensitive material ( ).